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Etch Hard Mask Film

Etch Hard Mask Film용 재료는 소자의 미세화에 따라 미세패턴 구현을 위해 도입된 Hard Mask용 ACL(Amorphous Carbon Layer : 비정질 탄소박막) Precursors입니다. (주)디엔에프의 ACL Precursors인 1-Hexene과 Propylene은 탄소 함유량이 높아 Etch Resistance가 우수하기 때문에 미세패턴 구현이 용이합니다.

Etch Hard Mask Film

Product Structure Property MSDS
1-Hexene Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity
: C6H12
: 84.16g/mol
: 60~66℃
: 21℃/155torr
: Colorless liquid
: Stable
Propylene Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity
: C3H6
: 42.08g/mol
: -47℃
: 37℃/15.4atm
: Colorless Gas
: Stable
4MS   Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity
: C4H12Si
: 88.22g/mol
: 26~28℃
: -
: Colorless liquid
: Stable
3MS   Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity
: C3H10Si
: 74.20g/mol
: 6.7℃
: -
: Colorless Gas
: Stable