The semiconductor industry is the one in which process miniaturization is emerging as a major issue. Accordingly,
DNF is concentrating on the development of next-generation core materials that can be optimal solutions for the development of the semiconductor industry.

R&D items

• Precursor for DPT
• Silicon and boron precursors for low-k and ultra-low-k films
• Precursor for low-temperature gap-fill (flowable oxide) insulating film
• Versatile SiO₂, SiN, SiOC(X), SiCN precursor capable of ALD/CVD process
• High-k precursors for metal gates
• High-k precursors for capacitors
• Precursor for Area Selective Deposition
• Precursors for wiring materials
• GST precursor for PRAM