Barrier Metal DPT Material Electrode Material Etch Hard Mask Filem GST Material Gap Fill Material High-k for Capacitor High-k for Metal Gate Low-k Metallization Metal SiO2 / SiN Semiconductor device requires dielectric materials for isolation on STI(Shallow Trench Isolation), IMD(Inter-Metal Dielectric), and PMD(Pre-Metal Dielectric). For this process CVD(Chemical Vapor Deposition) and HDP(High Density Plasma) was usually used, but it started forming void inside STI as memory density is getting high. To make uniform and void-free gap-filling, SOD(Spin on Dielectric) is used for devices below 45nm. PRODUCT D2S2 Bis(ethylmethylamino)silane 자세히보기 PS Polysilazane 자세히보기 TIPAS Tris(isopropylmino)silane 자세히보기 Tri-DMAS Tris(dimethylamino)Silane 자세히보기 D2S2 Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Bis(ethylmethylamino)silane Chemical formula C6H18N2S formula weight (g/mol) 146.3 Boiling point (℃) 134 Vapor pressure (℃/torr) 25 / 5.63 Phase Colorless Liquid Water reactivity Slowly react 닫기 PS Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Polysilazane Chemical formula [SiH2-NH]n formula weight (g/mol) 5000~6000 Boiling point (℃) - Vapor pressure (℃/torr) - Phase Colorless Liquid Water reactivity Slowly react 닫기 TIPAS Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Tris(isopropylmino)silane Chemical formula C9H25N3Si formula weight (g/mol) 203.4 Boiling point (℃) 170 Vapor pressure (℃/torr) 20 / 1.2 Phase Colorless Liquid Water reactivity Violently react 닫기 Tri-DMAS Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Tris(dimethylamino)Silane Chemical formula C6H19N3Si formula weight (g/mol) 161.3 Boiling point (℃) 145 Vapor pressure (℃/torr) 25 / 7 Phase Colorless Liquid Water reactivity Slowly react 닫기